Optical and EUV projection lithography: A computational view
Andreas Erdmann, Tim Fühner, Peter Evanschitzky et al. · Microelectronic Engineering · 2014
Cited by 35
Author · Kantonsspital Baden
Andreas Erdmann
- Works
- 339
- Cited by
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Most-cited papers
Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography
Viviana Agudelo, Peter Evanschitzky, Andreas Erdmann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012
Cited by 3
3d mask simulation and lithographic imaging using physics-informed neural networks
Vlad Medvedev, Andreas Erdmann, Andreas Roßkopf · Fraunhofer-Publica (Fraunhofer-Gesellschaft) · 2024
Cited by 2Open access
Exploring the limits of high contrast contact imaging using split pupil exposures in high-NA EUV lithography
Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky et al. · 2024
Cited by 1
Imaging effects of particles on the surface of EUV mask and wafer
Rawan Semaan, Gerardo Bottiglieri, Andreas Erdmann et al. · 2024
Cited by 1