article · Electronics Letters · 2004
Behaviour of logic gates fabricated on Si/SiGe MODFET technology
V.D. Juncu, Ingmar Kallfass, Raymond Sloan, J.V. Hatfield
Cited by 2Abstract and details only
Abstract
The behaviour of two fabricated logic gates using n-type Si/SiGe MODFETs is reported. S-parameter measurements show that the voltage separation between states at 20 GHz is 15 dB for the NAND gate and 8 dB for the NOR gate. The measured DC levels of the outputs allow the possibility of cascading the gates for use in more complex circuits.
Cite this paper
Juncu, V., Kallfass, I., Sloan, R., & Hatfield, J. (2004). Behaviour of logic gates fabricated on Si/SiGe MODFET technology. Electronics Letters, 40(12), 772–774. https://doi.org/10.1049/el:20040494
Juncu, V.D., et al. “Behaviour of logic gates fabricated on Si/SiGe MODFET technology.” Electronics Letters, vol. 40, no. 12, 2004, pp. 772–74, https://doi.org/10.1049/el:20040494.
Juncu, V.D., Ingmar Kallfass, Raymond Sloan, and J.V. Hatfield. 2004. “Behaviour of logic gates fabricated on Si/SiGe MODFET technology.” Electronics Letters 40 (12): 772–74. https://doi.org/10.1049/el:20040494.
Juncu, V. et al. (2004) ‘Behaviour of logic gates fabricated on Si/SiGe MODFET technology’, Electronics Letters, 40(12), pp. 772–774. Available at: https://doi.org/10.1049/el:20040494.
@article{juncu2004behaviour,
title = {{Behaviour of logic gates fabricated on Si/SiGe MODFET technology}},
author = {Juncu, V.D. and Kallfass, Ingmar and Sloan, Raymond and Hatfield, J.V.},
journal = {Electronics Letters},
volume = {40},
number = {12},
pages = {772--774},
year = {2004},
doi = {10.1049/el:20040494}
}Made from the index record. Check names, capitalisation and page numbers against the paper. Need another style? AI for Research has over 10,000.
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