article · 2008

for Patterned Media By

Caroline Ross, Samuel M. Allen, Anay Chaube

Cited by 0Abstract and details only

Abstract

As device size decreases, conventional lithographic methods are finding it increasingly hard to keep up. Introduction of newer method such as E-beam, X-ray lithography etc. has demonstrated possibility of scaling to lower dimensions. However most of these methods are too expensive, too complex or too slow. Hence a method is required which can provide high resolutions at low cost, is easy to implement and can be integrated with current processing technologies. Block copolymer self assembly promises to do just that. An immiscible block copolymer will microphase separate into individual domains due to unfavorable

Cite this paper

APA 7

Ross, C., Allen, S. M., & Chaube, A. (2008). for Patterned Media By.

MLA 9

Ross, Caroline, et al. “for Patterned Media By.” 2008.

Chicago

Ross, Caroline, Samuel M. Allen, and Anay Chaube. 2008. “for Patterned Media By.”

Harvard

Ross, C., Allen, S.M. and Chaube, A. (2008) ‘for Patterned Media By’.

BibTeX

@article{ross2008patterned,
  title = {{for Patterned Media By}},
  author = {Ross, Caroline and Allen, Samuel M. and Chaube, Anay},
  year = {2008}
}

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