article · 2018
Modeling and Simulation
Cited by 4Abstract and details only
Abstract
CONTENTS 31.1 Introduction into Lithography Simulation 65031.1.1 Aerial and Resist Image Formation 651 31.1.2 Physical/Chemical Modifications during the Processing of thePhotoresist 654 31.1.3 General Simulation Strategies 65531.2 Rigorous Modeling of Light Diffraction from Masks 656 31.2.1 Motivation 656 31.2.2 General Remarks on Rigorous Electromagnetic Field Solvers 658 31.2.3 Finite-Difference Time-Domain Method 66031.2.3.1 A Short History of FDTD 660 31.2.3.2 The FDTD Algorithm 66031.2.4 Coupling with Standard Lithography Simulations and Performance Considerations 66731.2.5 Field Decomposition Techniques and other Enhancements 669 31.3 Application of Simulation to Different Mask Types 67031.3.1 Binary Masks 670 31.3.2 Phase Shift Masks 672 31.3.3 EUV-Masks 67531.3.3.1 Efficient Modeling of EUV-Masks 676 31.3.3.2 Mask-Induced Imaging Artifacts in EUV Lithography 67931.4 Simulation of Mask Defects 681 31.4.1 Standard Defect Printability Considerations 681 31.4.2 Rigorous EMF Simulation of Defects on Optical Masks 683 31.4.3 EUV Multilayer Defects 68531.5 Summary 686 Acknowledgments 687 References 688Modeling and simulation have become indispensable tools for the understanding and optimization of lithographic processes and for the development of new process technology. Aerial image simulation is used to evaluate the imaging of designed photomasks and to explore the impact of optical parameters, such as numerical aperture (NA), partial coherence s, and defocus, and wave aberrations on the imaging performance of a projection stepper or scanner. Other simulation approaches are used to describe theimpact of the photoresist thickness, of the post-exposure bake (PEB) temperature and of the development characteristics of the photoresist on the total process performance. Lithography simulation is also used as an effective learning tool for new process engineers, scientists, and managers.
Cite this paper
Erdmann, A. (2018). Modeling and Simulation. https://doi.org/10.1201/9781420028782-44
Erdmann, Andreas. “Modeling and Simulation.” 2018, pp. 673–716, https://doi.org/10.1201/9781420028782-44.
Erdmann, Andreas. 2018. “Modeling and Simulation.” https://doi.org/10.1201/9781420028782-44.
Erdmann, A. (2018) ‘Modeling and Simulation’. Available at: https://doi.org/10.1201/9781420028782-44.
@article{erdmann2018modeling,
title = {{Modeling and Simulation}},
author = {Erdmann, Andreas},
pages = {673--716},
year = {2018},
doi = {10.1201/9781420028782-44}
}Made from the index record. Check names, capitalisation and page numbers against the paper. Need another style? AI for Research has over 10,000.